2007
Y. Sun, S.E. Thompson, and T. Nishida, “Physics of strain effects in semiconductors and metaloxide- semiconductor field-effect transistors,” Journal of Applied Physics 101, 104503 2007, pg.1-22.
R. Arghavani, N. Derhacobian, V. Banthia, M. Balseanu, N. Ingle, H. M’Saad, S. Venkataraman, E. Yieh, Z. Yuan, L.-Q. Xia, Z. Krivokapic, U. Aghoram, K. MacWilliams, and S.E. Thompson, “Strain Engineering to Improve Data Retetntion Time in Nonvolatile Memory,” IEEE Transactions on Electron Devices Vol. 54, Issue 2, Feb 2007, pg. 362-365.
S. Suthram, J. C. Ziegert, T. Nishida, and S. E. Thompson, "Piezoresistance Coefficients of (100) Silicon nMOSFETs Measured at Low and High (~1.5 GPa) Channel Stress," IEEE Electron Device Letters, Vol. 28, NO. 1, January 2007
2006
Y. Sun, G. Sun, S. Parthasarathy, and S.E. Thompson, “Physics of Process Induced Uniaxially Strained Si,”, Materials Science & Engineering B, 135 (2006) pg. 179-183.
X. Yang, J. Lim, G. Sun, K. Wu, T. Nishida, and S. E. Thompson, "Strain-induced changes in the gate tunneling currents in p-channel metal-oxide-semiconductor field-effect transistors," Applied Physics Letters 88, 052108, 2006.
Scott E. Thompson, Senior Member, IEEE, Guangyu Sun, Youn Sung Choi, and Toshikazu Nishida, "Uniaxial-Process-Induced Strained-Si: Extending the CMOS Roadmap," IEEE Transactions on Electron Devices, Vol. 53, NO. 5, May 2006
Ji-Song Lim, Xiaodong Yang, Toshikazu Nishida, and Scott E. Thompson, "Measurement of conduction band deformation potential constants using gate direct tunneling current in n-type metal oxide semiconductor," Applied Physics Letters 89, 073509, 2006.
Scott E. Thompson and Srivatsan Parthasarathy, "Moore’s law: the future of Si microelectronics," Materials Today, Vol. 9, No. 6, June 2006